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FC-3 Gas Flow Control System
The FC-3 Gas Flow Control System is designed for vacuum deposition equipment for the precise control and maintenance of the gas flow rates. The newly developed system allows the user to control and regulate the gas flows in accordance to one or more process parameters.
The FC-3 Gas Flow Control System is successfully used in the following applications:
- accurate maintaining of the specified pressure in the chamber
- maintaining of the thin film stoichiometry in the reactive magnetron sputtering processes (through the optical emission control or voltage control).
The system can be operated either in manual or fully automated mode (RS 232 interface).
The FC-3 Gas Flow Control System comprises of the Gas Control Unit (Flow Controller FC-3) and Gas Leak Valves. Specially designed Plasma Emission Sensor can be also supplied with the Gas Control System for maintaining of the pre-set thin film stoichiometry. All components can be supplied either separately or as a complete system.
Please refere to the file "FC-3 Gas Flow Control System" to obtain detailed information about the system and its application options or please contact Izovac specialists directly.
Send request for Gas Control System
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